Raipur: The International Institute of Information Technology, Naya Raipur (IIIT-NR), has established a VLSI-Nano Fabrication Laboratory on its campus to hold out superior analysis in nanotechnology. The lab , and goals
Dr. Manoj Kumar Majumder, Assistant Professor of Electronics and Communication Engineering, acknowledged that the laboratory, which is funded by the Department of Science and Technology (DST), will improve the institute’s current analysis infrastructure. “The IIIT-NR can now engage in cutting-edge research in nanotechnology, positioning itself as a leading research institution. It also provides a platform for undergraduate, graduate, and postgraduate students to explore new research avenues in microelectronics, optoelectronics, and nanotechnology.”
The nano-fabrication lab homes a spread of devices and machines that allow superior analysis in Nanotechnology and Fabrication. It features a Low Pressure Chemical Vapour Deposition (LPCVD) system for Thin Film Deposition and Surface Modification. The lab is provided with a high-temperature furnace that includes two heating zones and three fuel chambers for depositing supplies comparable to Graphene and Carbon Nanotubes (CNT). It additionally incorporates a low-pressure CVD reactor for depositing supplies like Silicon, Silicon Carbide, and Diamond. These services facilitate the fabrication of intricate nanostructures and the exploration of the distinctive properties of those supplies.
To guarantee correct characterization of skinny movies, the lab options the superior Theta Metrisis system. This system excels in measuring exact movie thickness inside the vary of 20 nm to 80 µm. Additionally, it allows in-depth evaluation and fine-tuning of nanoscale digital units by assessing the optical properties of assorted skinny movie classes. TNN